http://rdf.ncbi.nlm.nih.gov/pubchem/patent/DE-102009014610-A1
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_44ff3005508304394801e265e503b811 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-80 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-34 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-54 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-34 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-32 |
| filingDate | 2009-03-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e34c21a8861c45dbe7c96760158af6a7 |
| publicationDate | 2009-10-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | DE-102009014610-A1 |
| titleOfInvention | Photomask blank, photomask and method of making the same |
| abstract | The present invention provides a photomask blank for fabricating a phase shift mask having a translucent substrate on which is provided a phase shift portion adapted to impart a predetermined phase difference to transmitted exposure light. The phase shift portion is an ablation portion that is ablated from a surface of the transparent substrate to an ablation depth that is capable of producing the predetermined phase difference with respect to exposure light that is transmitted at a portion through the transparent substrate in which the phase shift portion is not provided becomes. The photomask blank has an etching mask layer disposed on the ablation-side surface of the transparent substrate, which is made of a material dry-etchable by a chlorine-based gas but not dry-etchable by a fluorine-based gas and serves as an etching mask at least until then to which is achieved in forming the Abtragungsabschnitts by dry etching the Abtragtiefe. The photomask further has a light-shielding layer formed on a surface of the etching mask layer, which is made of a material mainly containing tantalum and has a thickness such as to dry during dry-etching to form the ablation portion of the translucent substrate. |
| priorityDate | 2008-03-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 45.