| abstract |
ThenThe invention relates to a device for coating substratesnwith one in a reactor housingnarranged process chamber (1) and arranged therein, innSubstantial cup-shaped susceptorn(2, 3), with the bottom of the pot bottomn(4) up to the process chamber (1) points and the Topfseitenwandungnwith one in the area of the pot openingnarranged supporting flankn(5) on a susceptor carriern(6) is supported. tonAdvantageous training is proposed that thenSusceptor consists of two separable parts, wherena ring-shapednlower part (3) of the susceptor at least one supporting flankn(5) forming section of the pot sidewall and an upper onenPart of the susceptor (2) at least the entire pot bottom (2 ') of thenSusceptors training. |