http://rdf.ncbi.nlm.nih.gov/pubchem/patent/DE-102007026086-B4

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http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L29-00
filingDate 2007-06-04-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2009-03-05-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_60566881824aefc7d9be49d487663a22
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publicationDate 2009-03-05-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber DE-102007026086-B4
titleOfInvention A method of forming a dielectric thin film on a titanium substrate, a titanium substrate with a thin film produced by the method, and its use
abstract A method of forming a dielectric thin film on a titanium substrate, in which a titanium substrate having a purity of at least 99% at the surface where the thin film is to be formed is polished or modified for surface improvement and / or cleaning; Subsequently, an electrochemical oxidation is carried out with an electrolyte having a pH in the range 4 to 10, by applying an electric voltage in the range of -1 to 70 V, wherein the titanium substrate is connected as an anode; In this case, a TiO 2 thin film having a constant layer thickness is formed over the surface, with a predeterminable depending on the maximum electrical voltage layer thickness, which is independent of the grain orientation of the titanium substrate.
priorityDate 2007-06-04-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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