Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_4d72711e97d894c55af805c9de2053ab |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3212 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31053 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02024 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3212 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K3-1409 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31053 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09G1-02 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-302 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K3-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09G1-02 |
filingDate |
2005-12-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_db8274686419dc1b290290cf0c4c240d http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_953fc1255eebb95e564f1a563326bfc2 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_00a1ae069468972ea8fadd6146982f16 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8c1ea88bdc6b3aca45374451675cbf80 |
publicationDate |
2006-07-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
DE-102005058692-A1 |
titleOfInvention |
Polishing compositions for reducing erosion in semiconductor wafers |
abstract |
ThenaqueousnPolishing composition is for polishing semiconductor substratesnsuitable. The polishing solutionncomprises from 0.001 to 2% by weight of a polyvinyl alcohol copolymer, whereinnthe polyvinyl alcohol copolymer a first component, a secondnComponent and a weight average molecular weight of 1000nto 1000000 g / mol and wherein the first component 50 bisn95 mole percent vinyl alcohol and the second component is more hydrophobicnis as the vinyl alcohol, and 0.05 to 50 wt .-% silica abrasive particles,nwherein the composition has a pH of 8 to 12. |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-2378552-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/DE-102007019565-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/DE-112013005718-B4 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9593259-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/DE-102013016780-B4 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/DE-102010014940-A1 |
priorityDate |
2004-12-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |