http://rdf.ncbi.nlm.nih.gov/pubchem/patent/DE-102005058692-A1

Outgoing Links

Predicate Object
assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_4d72711e97d894c55af805c9de2053ab
classificationCPCAdditional http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3212
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31053
classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02024
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3212
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K3-1409
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31053
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09G1-02
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-302
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K3-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09G1-02
filingDate 2005-12-08-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_db8274686419dc1b290290cf0c4c240d
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_953fc1255eebb95e564f1a563326bfc2
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_00a1ae069468972ea8fadd6146982f16
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8c1ea88bdc6b3aca45374451675cbf80
publicationDate 2006-07-27-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber DE-102005058692-A1
titleOfInvention Polishing compositions for reducing erosion in semiconductor wafers
abstract ThenaqueousnPolishing composition is for polishing semiconductor substratesnsuitable. The polishing solutionncomprises from 0.001 to 2% by weight of a polyvinyl alcohol copolymer, whereinnthe polyvinyl alcohol copolymer a first component, a secondnComponent and a weight average molecular weight of 1000nto 1000000 g / mol and wherein the first component 50 bisn95 mole percent vinyl alcohol and the second component is more hydrophobicnis as the vinyl alcohol, and 0.05 to 50 wt .-% silica abrasive particles,nwherein the composition has a pH of 8 to 12.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-2378552-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/DE-102007019565-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/DE-112013005718-B4
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9593259-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/DE-102013016780-B4
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/DE-102010014940-A1
priorityDate 2004-12-17-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

Incoming Links

Predicate Subject
isDiscussedBy http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419579080
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID19
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID420244777
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID441
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID415861834
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID428
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID84979
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419593286
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID39800
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419579079
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID169042
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID24261
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID1057
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID26868
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID449728501
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID16134267
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID410916410
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419527069
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID533728
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID134919
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419513606
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419523396
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419526493
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID61739
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID54215275
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID409432392
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID451777772
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID415830292
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID11199
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419547110
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID134974
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419474382
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419490819
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID370
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID425779893
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID457707758
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID8868
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID1133
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID167232
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID84927
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID408122650
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID421451112

Total number of triples: 70.