http://rdf.ncbi.nlm.nih.gov/pubchem/patent/DE-102005049274-A1
Outgoing Links
Predicate | Object |
---|---|
assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_4ddcb273a108a5d8472b335280098e06 |
classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/D21H25-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/D21C9-007 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/D21C9-10 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/D21C9-10 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/D21G1-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/D21H25-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05H1-48 |
filingDate | 2005-10-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_89d53634be6fdb90f69a2d713c86dbfb http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ee276b7dd33b8438875acfb10bbac9a5 |
publicationDate | 2006-12-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | DE-102005049274-A1 |
titleOfInvention | Process for the treatment of a process material with large-area plasma |
abstract | ThenThe invention relates to a method for treating a process material,nwherein the process material with, preferably non-thermal, large-area plasma,npreferably at least atmospheric pressure, in contact,nthe plasma in the immediate vicinityngenerated to the process material or in the process material or in the immediatenSurrounding a gas discharge, in particular a corona discharge, preferablynat least atmospheric pressure,nis produced. To improve the treatment of the process material with plasmanand the effectivenessnTo increase, are used to generate the plasma or gas dischargenbetween electrodes (43, 44) high voltage pulses (66, 67) with anDuration (62) less than 10 μsngenerated. |
priorityDate | 2005-06-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 27.