http://rdf.ncbi.nlm.nih.gov/pubchem/patent/DE-102005049274-A1

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assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_4ddcb273a108a5d8472b335280098e06
classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/D21H25-04
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classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/D21C9-10
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filingDate 2005-10-14-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_89d53634be6fdb90f69a2d713c86dbfb
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ee276b7dd33b8438875acfb10bbac9a5
publicationDate 2006-12-28-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber DE-102005049274-A1
titleOfInvention Process for the treatment of a process material with large-area plasma
abstract ThenThe invention relates to a method for treating a process material,nwherein the process material with, preferably non-thermal, large-area plasma,npreferably at least atmospheric pressure, in contact,nthe plasma in the immediate vicinityngenerated to the process material or in the process material or in the immediatenSurrounding a gas discharge, in particular a corona discharge, preferablynat least atmospheric pressure,nis produced. To improve the treatment of the process material with plasmanand the effectivenessnTo increase, are used to generate the plasma or gas dischargenbetween electrodes (43, 44) high voltage pulses (66, 67) with anDuration (62) less than 10 μsngenerated.
priorityDate 2005-06-16-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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Total number of triples: 27.