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publicationDate 2006-12-07-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber DE-102005024912-A1
titleOfInvention A technique of making copper-containing leads embedded in a low-k dielectric by providing a stiffening layer
abstract BynProviding a stiffening layer on three side walls of anwith a copper-containing metal to be filled trench, the reducednthermomechanical confinement strength of a material with small ε at leastncompensated to a certain extentnto reduce electromigration effects, and thenLifetime of modern semiconductor devices that increasenHave metallization layers, in which dielectric materialsnwith small ε innConnection with copper-based metal cables are included.
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