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publicationDate 2007-02-08-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber DE-102005014748-B4
titleOfInvention Technique for electrochemical deposition of a chemical order alloy
abstract Plating method for a damascene technique for semiconductor devices with: contacting a structured surface to be coated with an electrolyte, the electrolyte having a first consumable electrode comprising a first metal, and a second consumable electrode having a second metal different from the first metal in contact; Generating a first current by means of the electrolyte between the first consumable electrode and the surface; and Generating a second current by means of the electrolyte between the second consumable electrode and the surface
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