http://rdf.ncbi.nlm.nih.gov/pubchem/patent/DE-102005005801-A1

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filingDate 2005-02-04-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ab70ef665de042479192a306a0eb09d9
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publicationDate 2006-08-17-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber DE-102005005801-A1
titleOfInvention Electrostatic deflection system for corpuscular radiation
abstract ThenThe invention relates to electrostatic deflection systems for corpuscular beams,nespecially fornMicro- and nanostructured applications in lithography equipmentnor measuring devicesncan be used. According to the askednTask should be the individual electrodes of such a deflection systemnpermanently a very accurate axial symmetric arrangement to each othernhave and maintain. In the electrostatic deflection system according to the inventionnare rod-shapednElectrodes in axial symmetric arrangement in a hollow insidencarriernheld by a corpuscular beam can be directed.nThe carriernis at least two and a maximum of four interconnectablensupport elementsneducated.
priorityDate 2005-02-04-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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Total number of triples: 30.