http://rdf.ncbi.nlm.nih.gov/pubchem/patent/DE-102004030861-A1
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_36f8253f3d0d59bcd9259217d4385d10 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-11 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-11 |
| filingDate | 2004-06-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c5b2050bd2bf43ca18f79252cab449b5 |
| publicationDate | 2006-01-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | DE-102004030861-A1 |
| titleOfInvention | A method of patterning a semiconductor substrate using a protective layer that reduces or prevents outgassing during exposure |
| abstract | ThenThe present application relates to a process for lithographicnStructuring of semiconductor substrates, taking on the photoresistna protective layer is applied to prevent during thenor gaseous after exposurenProducts are released from the resist layer. |
| priorityDate | 2004-06-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 27.