http://rdf.ncbi.nlm.nih.gov/pubchem/patent/DE-102004005241-A1

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filingDate 2004-01-30-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ebae93bd3af82235ca2f034b08c7515e
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publicationDate 2005-08-25-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber DE-102004005241-A1
titleOfInvention Method and device for the plasma-based generation of soft X-rays
abstract The invention relates to a method and a device for plasma-based generation of soft X-ray radiation, in particular for generating extreme ultraviolet (EUV) radiation. The object to find a new way to provide a target for a plasma-based radiation source, which allows a reduction in the heating and erosion of the nozzle and thus an improved temperature control at the injection device is achieved according to the invention by a closure device (2) between the target nozzle ( 1) and the interaction region (41) which interrupts an opening (22) for the temporary passage of the target stream (12) through mechanically movable elements (23, 24, 25), at least a portion (13) of the reproducibly provided target stream (12). 12) to interact with the energy beam (3) only during such time intervals in which the shutter device (2) prevents optical transmission from the interaction region (41) to the target nozzle (1).
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Total number of triples: 33.