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filingDate 2001-11-20-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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publicationDate 2003-05-28-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber DE-10156932-A1
titleOfInvention Process for the deposition of thin praseodymium oxide layers using the ALD / CVD process
abstract The invention relates to a method for producing thin praseodymium oxide layers as a dielectric in an electronic component of a semiconductor device. The praseodymium oxide is deposited by a CVD process or an ALD process. The method allows the deposition of praseodymium layers on substrates with high topography.
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