| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_36f8253f3d0d59bcd9259217d4385d10 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-108
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-106
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0757 |
| classificationIPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-075 |
| filingDate |
2001-07-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_01522cb504718b648422ee782a37f95b
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_624b7f5ab6d1fee2f715680eebac457f
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7f9d76549ee448b7df8679effef0f40f
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_33319a0edd0d6851d28aaacab3a60d9d
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1f9aa87dd1acd3089d2b5d01dcc6944b
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_aaa9fe0ea165caddb81913f4e64127a5 |
| publicationDate |
2003-02-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
DE-10137109-A1 |
| titleOfInvention |
Silicon-containing resist for photolithography |
| abstract |
The invention relates to a photoresist which contains a polymer which has a main chain composed of alternating silicon and oxygen atoms, and to a polymer partial chain which is connected to this as a side chain and whose chain is composed of carbon atoms. The chain made up of carbon atoms comprises acid-labile groups, so that the photoresist according to the invention can be designed as a chemically amplified photoresist. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/DE-10246546-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2009124829-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/DE-10246546-B4 |
| priorityDate |
2001-07-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |