| abstract |
Organic anti-reflective polymer represented by the following formula 1, its manufacturing method, an anti-reflective coating composition comprising said organic anti-reflective polymer, and a manufacturing method for an anti-reflective coating made therefrom. The anti-reflective coating comprising the disclosed polymer eliminates standing waves caused by the optical properties of lower layers on the wafer and the thickness changes of the photoresist, prevents back reflection and CD change caused by that of such lower layers diffracted and reflected light is caused. Such advantages enable stable ultrafine structures suitable for 64M, 256M, 1G, 4G, and 16G DRAM semiconductor devices to be formed and improve production yields. It is also possible to control the k-value, and the increased hydrophobicity facilitates EBR (Edge Bead Removal). DOLLAR F1 |