http://rdf.ncbi.nlm.nih.gov/pubchem/patent/DE-10131487-B4
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_36f8253f3d0d59bcd9259217d4385d10 |
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-40 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-32 |
| classificationIPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-40 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-32 |
| filingDate | 2001-06-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2005-11-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bea0ecdaac793d07bc84f7404c954adc http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1f9aa87dd1acd3089d2b5d01dcc6944b http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_33319a0edd0d6851d28aaacab3a60d9d http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_aaa9fe0ea165caddb81913f4e64127a5 |
| publicationDate | 2005-11-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | DE-10131487-B4 |
| titleOfInvention | Negative resist process with simultaneous development and aromatization of resist structures |
| abstract | Process for producing enhanced negative resist structures, characterized by the following steps. (a) applying a chemically amplified resist to a substrate, wherein the resist contains the following components: a polymer comprising acid labile groups that are cleaved under the action of acid to release an anchor group, causing a change in the polarity of the polymer; a photoacid generator; a solvent; (b) removing the solvent to obtain a photosensitive resist film; (c) exposing the resist film in sections, wherein an acid is released in the exposed portions of the resist film from the photoacid generator; (d) contrasting the exposed resist film, wherein in the exposed portions of the resist film by the acid, the acid labile groups of the polymer are cleaved off and the anchor groups are released; (e) developing the exposed and contrasted resist film with a developer containing the following components: a solvent in which the polymer, which contains acid-labile groups, ... |
| priorityDate | 2001-06-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 61.