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filingDate 2001-06-19-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2002-11-21-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9f0ac5625c89b2bb450cec570ac0bcb1
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publicationDate 2002-11-21-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber DE-10129313-C1
titleOfInvention Sputtering method and apparatus for coating and / or surface treatment of substrates
abstract The invention relates to a sputtering process for coating and surface treatment of substrates by means of a structured electrode mask, which is provided with openings and is arranged on the substrate. Likewise, the invention relates to a device for coating and surface treatment of substrates.
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