http://rdf.ncbi.nlm.nih.gov/pubchem/patent/DE-10113252-A1

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classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-8242
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filingDate 2001-03-19-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_169496b8225c23b30356244159ee7fa8
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publicationDate 2002-10-02-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber DE-10113252-A1
titleOfInvention Method for producing a trench provided with an insulation collar, in particular for a trench capacitor
abstract An insulation layer (12) and then a masking layer (14) are first deposited in a trench (4) and then the trench (4) is filled with a filling material (18) up to a predetermined height. The areas of the masking layer (14) which are not covered by the filling material (18) are modified near the surface, so that unmodified areas of the masking layer (14) can be selectively etched to modified areas of the masking layer (14). As a result, a mask (26) can be produced from the masking layer (14) and is used for the subsequent etching of the insulation layer (12). Advantage of the method according to the invention is the possibility of the insulation layer (12) to form an insulation collar isotropically z. B. wet chemical etching.
priorityDate 2001-03-19-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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