http://rdf.ncbi.nlm.nih.gov/pubchem/patent/DE-10102742-C1
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_8f063b8222ec3c8e746a415e7f364473 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-0281 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-02 |
| filingDate | 2001-01-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2002-09-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d21228efb5d690ad0dee4e0c1f8eaf7e |
| publicationDate | 2002-09-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | DE-10102742-C1 |
| titleOfInvention | Wolframabscheideprozess |
| abstract | In a tungsten deposition process, a nucleation step is carried out in a reaction chamber to form a tungsten crystal layer over a substrate using tungsten hexafluoride, silane and nitrogen as reactive gases. An intermediate step is carried out so that the supply of tungsten hexafluoride into the reaction chamber is stopped, but the supply of silane is continued. Furthermore, nitrogen is optionally passed through the reaction chamber. Finally, a main deposition step is carried out to form a tungsten layer over the tungsten crystal layer using tungsten hexafluoride, hydrogen and nitrogen as reactive gases. |
| priorityDate | 2001-01-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 31.