| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_24aca9ded2638ea793d05360dde7a4a0 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-111
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate |
2000-12-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a9b0528a8ae6ad84bf0d1255548c1110
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0b36d5bfe2e6c486590f546177af97b6
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_47dfc59ffde831488f20bdcd86fb640a |
| publicationDate |
2001-06-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
DE-10063064-A1 |
| titleOfInvention |
Chemically enhanced positive resist composition |
| abstract |
A chemically amplified positive resist composition suitable for use in an exposure process using an ArF excimer laser and capable of forming a resist coating exhibiting high hydrophilicity; is excellent in adhesion to a substrate and satisfactory in resist properties; and DOLLAR A a resin (X) containing a polymeric unit (a) derived from (meth) acrylic acid dihydroxy-1-adamantyl ester and a polymeric unit (b) derived from (meth) acrylic acid 2-alkyl-2-adamantyl ester and which is insoluble or slightly soluble in alkali per se, but becomes soluble in alkali by the action of an acid; and an acid generating agent (Y). |
| priorityDate |
1999-12-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |