http://rdf.ncbi.nlm.nih.gov/pubchem/patent/DE-10041565-B4

Outgoing Links

Predicate Object
assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_e5db580deca7130dbe51805c6c608b35
classificationCPCAdditional http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L2924-0002
classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L23-53238
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-7681
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76873
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76868
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76858
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76846
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-768
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L23-53233
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76874
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3205
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L23-52
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L23-532
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-304
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-768
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-306
filingDate 2000-08-24-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2006-02-23-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bb9f0ac5b72c5c866c809ed9d704b2d7
publicationDate 2006-02-23-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber DE-10041565-B4
titleOfInvention Metal interconnect, semiconductor device, method of forming a metal interconnect, and method of fabricating a semiconductor device
abstract A metal interconnect buried in an insulating film and comprising: an adhesion layer containing zirconium and formed on the insulating film; a barrier layer formed on the adhesion layer; Copper-zirconium alloy islands formed separately between the adhesion layer and the barrier layer; and an interconnection material containing copper as a main component and formed on the barrier layer.
priorityDate 1999-08-27-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

Incoming Links

Predicate Subject
isDiscussedBy http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID23960
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID94359
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419555779
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419577451
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419577454
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419577455
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID23942
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419577457
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID5359464
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419577459
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID418354341
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419583146
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID23978
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID23992
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID23995
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419593302
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID23980
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID23912
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID23951
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419559021

Total number of triples: 46.