| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_bc905cbef116a1ec61d12125af9427f3
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_3720d81f95cb00f5c4e8732a7e0d343e |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-106 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F232-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F232-04 |
| classificationIPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F232-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F232-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 |
| filingDate |
2000-03-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b4cfecbe59f5455605c634fc53ba67f1
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b0fcac0c7940a56bfde8bc640daaa164
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7865d1ded8752d3a73c3f9009fd25db5
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_69f3be0d10500262a8333481ccbcfc16
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_382bb6c51bbac0c9f707f7ab956f80c3 |
| publicationDate |
2001-09-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
DE-10014493-A1 |
| titleOfInvention |
Polymer with a pericyclic protecting group and resist composition containing it |
| abstract |
The present invention relates to a polymer with at least one pericyclic protective group, e.g. B. 2-Methyl-2-bicyclo [2.2.1] heptanyl. The resist composition containing the polymer can be used as a chemically amplified resist material and has a high etching resistance. In addition, using the resist composition, a line (line) space pattern with a line (line) spacing of 0.1 µm can be successfully resolved. |
| priorityDate |
2000-02-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |