http://rdf.ncbi.nlm.nih.gov/pubchem/patent/DD-236659-A3
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_8556f5eb9762288912189ad71a9d0653 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01B3-08 |
| filingDate | 1983-02-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bd4583fcfc73b71e58cc1b8e099520b5 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8000beceb461fc1d264a7beadf0c9c31 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f536dd09bf017f786e966f2fd650247a |
| publicationDate | 1986-06-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | DD-236659-A3 |
| titleOfInvention | PHOTO-SENSITIVE DIELECTRIC MASS |
| abstract | The photosensitive dielectric composition preferably relates to electronics and may find application in the fabrication of thick film circuits. The aim of the invention is the increase of the Ausloesungsvermoegens the mass. The photosensitive dielectric composition is made of leaded glass and the solution of a positive photoresist based on o-quinone diazide esters in an organic solvent. The novelty of the mass is that it additionally contains the solution of ethyl cellulose in α-terpineol, and that as a solution of the positive photoresist based on o-quinone diazide esters in an organic solvent, the solution of positive photoresist based on o-quinone diazide sulfoesters in dioxane is used in the following proportion of the components, parts by weight: leaded glass33.5-65.3solutions of the positive photoresist on the basis of quinone diazide sulphoesters in dioxane (in dry matter conversion) 5.0-30.0 ethylcellulose 0.6-3 , 0a-Terpineol10,9-28,2. |
| priorityDate | 1983-02-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 26.