http://rdf.ncbi.nlm.nih.gov/pubchem/patent/DD-228309-A1
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_dedea8576afaf9e47c88cfb45533bf9e |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C25D3-38 |
| filingDate | 1982-03-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a1c62fc7a5bfa644f23f79b42c5a21d4 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3115f23cc36c2b5a15b5744f4cbbceb7 |
| publicationDate | 1985-10-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | DD-228309-A1 |
| titleOfInvention | GALVANIC BATH FOR COPPER DIVING |
| abstract | The invention relates to a galvanic bath for copper deposition. The aim of the invention is the galvanic copper coating even sensitive substrates, a high surface and Strukturqualitaet the deposited copper layers, creating the conditions for the production of high-quality Magnetogrammtraeger, improved galvanization of pretreated aluminum and the creation of a bath, insensitive to contamination, not expensive and easy to wait. It was the task to solve, to find a weak acid to neutral bath of suitable composition. The bath according to the invention consists of a 0.02 to 0.2 molar aqueous solution of a salt or hydrogen salt of Tetraoxalatoduppfer- (II) acid, 1 to 5 times the molar amount of an ammonium salt of a strong acid and 2 to 10 times the molar amount of ammonium oxalate. Areas of application of the invention are electroplating, electroforming, the production of magnetomotive accumulators and electronic devices as well as the polygraphic industry. |
| priorityDate | 1982-03-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 43.