http://rdf.ncbi.nlm.nih.gov/pubchem/patent/DD-226309-A1

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Predicate Object
assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_2cf62d89bf35dd59ccf293730045e427
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C25D3-62
filingDate 1984-07-16-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_66792ddb34529db02ad1499a571b3cd7
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_dcdbc8a157ae5dc0ac73f963b7a180a0
publicationDate 1985-08-21-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber DD-226309-A1
titleOfInvention ELECTROLYTE FOR THE GALVANIC DEPOSITION OF A GOLD NICKEL ALLOY
abstract The invention relates to a high-speed electrolyte based on potassium dicyanoaurate (I) for the electrodeposition of a gold-nickel alloy, which is particularly suitable for the deposition of high-quality functional layers on components of electrical engineering / electronics. The electrolyte according to the invention, which is known to contain potassium dicyanoaurate (I) and nickel salt, conductive and buffering salt and brightener, is characterized in that nickel in the form of nickel citrate and potassium nickel nitrilotriacetate is contained in the ratio 1: 1 to 1: 4, the content of K (Au (CN2) 5 to 70 g / l and total nickel 0.5 to 5.0 g / l and the p H value p H should be 3.7 to 4.5 The electrolyte is suitable for automatic belt conveyor systems with deposition rates of 400 mm / h.
priorityDate 1984-07-16-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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