http://rdf.ncbi.nlm.nih.gov/pubchem/patent/DD-220030-A1

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classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F12-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F2-46
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filingDate 1983-12-23-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d51c5383e8aa915c59f81153ff6e8b37
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_191233ba7e6a8670948511a8152b8508
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publicationDate 1985-03-20-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber DD-220030-A1
titleOfInvention PROCESS FOR THE RADICAL POLYMERIZATION OF VINYL MONOMERES
abstract The invention relates to a process for the radical polymerization of vinyl monomers under the action of high-energy radiation in the presence of an organic matrix for the preparation of homo- and copolymers with high molecular weights and high polymerization rates of polar and apolar monomers. The matrix used is wax mixtures with microwax additions or fatty acid mixtures or fatty acid / fatty amine mixtures or amine mixtures of specific composition. The irradiation takes place at temperatures which are below the softening temperature of the matrix. After polymerization, the matrix can be separated from the polymer by melting or / and extracting.
priorityDate 1983-12-23-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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