http://rdf.ncbi.nlm.nih.gov/pubchem/patent/DD-218357-A1
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_da9c519bc5d52cdf9e2c478e123d9f7b |
| filingDate | 1983-05-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d3b57c82493363fba63aae7eb6b4695f http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f24797f4e8abcefdd0d2da961aae425b http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_547cd1b1d081116670ec66fbac2b55d1 |
| publicationDate | 1985-02-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | DD-218357-A1 |
| titleOfInvention | PROCESS FOR PREPARING NEW 4-NITRO-NAPHTHOCHINONE-1,2-DIAZIDE-2-SULFONIC ACID (5) |
| abstract | The invention relates to a process for the preparation of novel 4-nitro-naphthoquinone-1,2-diazide-2-sulfonic acid (5), which as a photosensitive component (LEK) in positive photoresists, for the structuring of microelectronic devices, for Diazotypiezwecke as well can be used in the form of azo dyes in the textile industry. The object of the invention is to enrich the state of the art by providing a new defined 4-nitro compound of naphthoquinone-1,2-diazide-2-sulfonic acid- (5). According to the invention, this is achieved by treating a 1,2-naphthoquinonediazide-2-sulfonic acid (5) in concentrated sulfuric acid, treating it with a mixed acid containing a high proportion of nitric acid, and after a relatively short reaction time of 1 to 2.0 hours, preferably at about 1.5 h, at a temperature between 5 C and 5 C, a complete separation of the nitro product is carried out in high yield. An optimal yield was achieved as a function of the reaction time, the mixed acid concentration and the temperature. |
| priorityDate | 1983-05-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 22.