http://rdf.ncbi.nlm.nih.gov/pubchem/patent/DD-154405-A1
Outgoing Links
Predicate | Object |
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assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_a9ca074b7b9d712da0cc947d98c5bab4 http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_bc0fdb72eabbfebc11991af307ac0635 http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_ae30ce8005d823b5747eebf91d5d27ac |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-26 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-54 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-30 |
filingDate | 1980-11-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bcbbb047379705d5df0aa0dea62aaea3 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6369202b60e9a1e544f87554bb8f162a http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_66c7b00167fd46a935abd44ae986f7b5 |
publicationDate | 1982-03-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | DD-154405-A1 |
titleOfInvention | EXPOSURE MASK FOR THE DUENSCHICHTTECHNIK |
abstract | The invention relates to an exposure mask for the Duennschichttechnik, in particular for the structuring of semiconductor devices. The aim of the invention is the production of semiconductor structures with high structural accuracy and component density and low cost. According to the invention, it is proposed to produce the structure-determining layer of an exposure mask for the thin-layer technique from amorphous carbon. The production of the amorphous carbon layer is carried out according to already proposed methods of ion-supported vacuum coating. The advantage of the inventive solution is that the carbon layer has a favorable transmission and blocking behavior for visible light or UV light. Furthermore, the structure is extremely resistant to abrasion and line widths up to 1 micrometer are realized. |
priorityDate | 1980-11-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 22.