http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CS-240582-B1
Outgoing Links
Predicate | Object |
---|---|
assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_3173ea1f1f14e0f818f052611b7d17e8 http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_b8e51a718207fe5106df6228141d56fd |
classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C25D3-562 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C25D3-56 |
filingDate | 1984-02-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_10b50413a19423666247182b23b6cc5a http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2f5a50d1d90ecc614ebc43103faa7402 |
publicationDate | 1986-02-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | CS-240582-B1 |
titleOfInvention | Electrolytic aqueous bath for nickel-phosphorus alloy deposition |
abstract | This bath comprises nickel fluoborate in a concentration of from 100 to 600 g per 1000 ml of water, boric acid in a concentration of from 10 to 50 g per 1000 ml of water, and nickel hypophosphite, sodium hypophosphite or ammonium hypophosphite, optionally phosphorous acid, in a concentration of from 1 to 50 g per 1000 ml of water. To eliminate hydrogen-pitting, a wetting agent is added in a concentration of from 0.01 to 1 g per 1000 ml of water. |
priorityDate | 1984-02-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 43.