http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CO-5221091-A1
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_dee69189a16d4c16c82e362d9cf88559 |
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/A61B2090-701 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/A61L2202-24 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/A61B1-123 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/A61L2-16 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/A01N37-16 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/A61L2-24 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/A61L2-186 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23F11-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/A61B1-00057 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/A61B90-70 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/A01N59-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/A61B1-12 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23F11-10 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23F11-08 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/A01N59-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/A01N37-16 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23F11-08 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/A01N37-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23F11-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/A01N25-10 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/A61B19-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/A01N43-647 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/A01N25-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08K3-32 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/A01N25-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08K5-3475 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/A01N59-26 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/A01N25-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/A61L2-24 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/A61B1-12 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/A61L2-18 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08K3-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/A61L2-16 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L71-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23F11-10 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08K5-09 |
| filingDate | 1999-10-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_23ce77035f0a2bed6912c846febf2b3c http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_fd9ae373a3728467f77369e40fa1473b http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_cbc5aa5f2bee91f658daaaf741c6be7a |
| publicationDate | 2002-11-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | CO-5221091-A1 |
| titleOfInvention | CONCENTRATED ANTIMICROBIAL SYSTEM OF MULTIPLE PARTS, ACTIVATED SOLUTION, SOLUTION OF USE BY DILUTION, PRODUCTION METHOD AND METHOD OF STERILIZING WITH A SOLUTION OF USE BY DILUTION |
| abstract | The present invention relates to a two-part or multi-part concentrated system for preparing an activated solution solution which can be diluted with water to a diluted antimicrobial solution that has improved anticorrosive properties at room temperature. The concentrated system contains a first component that contains an oxidizing agent, preferably hydrogen peroxide and a second component that contains at least formic acid in a concentration of approximately 25% by weight. At least one corrosion inhibitor and at least one surfactant are also included in the concentrated system. When mixed and diluted, the resulting solution is excellent in its sterilization and anticorrosive properties. A concentrated antimicrobial system comprising: a first component comprising hydrogen peroxide and water; a competent second comprising formic acid and water; a block copolymer of ethylene oxide and propylene oxide, said block polymer being present in said first component, in said second component, or in said first and second components; phosphoric acid present in said first component, said second component or in said first and second components; and benzotriazole present in said first component, said second component, or in said first and second components, wherein said first and second components are separated from each other. <EMI FILE = "99062302_1" ID = "1" MFI = JPEG> - 2 - A diluted antimicrobial solution comprising: from 0.05% by weight to 0.5% by weight of perfomic acid; from 0.07% by weight to 1.5% by weight of formic acid; from 0.4% by weight to 6.0% by weight of hydrogen peroxide; from 0.1% by weight to 0.5% by weight of block copolymer of ethylene oxide and propylene oxide; from 0.1% by weight to 0.5% by weight phosphoric acid; from 0.1% to 1.0% by weight of benzotriazole; and a remaining portion of water. A method of sterilizing an object comprising subjecting the object to the diluted antimicrobial solution of claim 9, to sterilize the object. A method of sterilizing an object comprising subjecting the object to the diluted antimicrobial solution of claim 10 for sterilizing the object. A method of sterilizing an object contaminated by bacterial spores which comprises subjecting the object to the diluted antimicrobial solution of claim 10 to sterilize the object. A method of preparing a diluted antimicrobial solution comprising: a) preparing a first component comprising from 30% by weight to 50% by weight of hydrogen peroxide, from 1.8% by weight to 10% by weight of benzotriazole and the remaining part water; b) preparing a second component comprising 20% by weight up to 95% by weight of formic acid, from 2.5% by weight up to 12% by weight of block copolymer of ethylene oxide and propylene oxide, from 4% by weight to 20% by weight phosphoric acid and the remaining part of water; and c) mixing the first component and the second component in a 60: 40 weight ratio to form an activated solution; and d) diluting the activated solution with water. An equilibrium antimicrobial activated solution, comprising: 25% by weight of hydrogen peroxide; 6.5% by weight of formic acid; from 4.5% to 5.0% by weight of perforic acid; 1.38% by weight of block copolymer of ethylene oxide and propylene oxide, 2.0% by weight of phosphoric acid; and a remaining part of water up to 100%. An anticorrosive system suitable for use with formic acid and hydrogen peroxide, said system comprising: a) phosphoric acid; b) benzotriazole; and c) a block copolymer of ethylene oxide and propylene oxide. |
| priorityDate | 1998-10-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 61.