http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-217220903-U
Outgoing Links
Predicate | Object |
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assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_71dc49b9e42d4e76aafe7634ee4f5f5b |
classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y02C20-40 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01D53-78 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01D46-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01D53-75 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01D53-80 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01D46-54 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01D53-50 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01D53-56 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01D46-62 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01D53-62 |
filingDate | 2021-12-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate | 2022-08-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_09b22e10ba30e239bea25d589b29245d http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_602945005c79f969d58a18c277346372 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5f30b21eb86e1433ea45103c74ac20df http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_43e0bb4fff547dea031ac53f2a3f50e2 |
publicationDate | 2022-08-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | CN-217220903-U |
titleOfInvention | An industrial silicon submerged arc furnace tail gas treatment system |
abstract | The present application discloses an industrial silicon submerged arc furnace tail gas treatment system, comprising: an air inlet, the air inlet is connected with a silicon powder absorption device, the silicon powder absorption device is connected with a dust collector, the dust collector is connected with a CO2 absorption device, and the dust collector A desulfurization device is connected, a denitration device is connected to the desulfurization device, a cooling device is connected to the denitrification device, and an exhaust pipe is connected to the cooling device. The NaOH tail gas filter plate, the desulfurization device is provided with a lime slurry layer, the denitration device is provided with a low-nitrogen burner, and the low-nitrogen burner is filled with HNCR polymer particles, and the cooling device is provided with a circulating water cooling pipe. After multi-stage treatment of a large amount of hot furnace tail gas generated during the treatment of industrial silicon ore, the exhaust gas can be discharged after meeting the exhaust gas emission standard, so as to avoid environmental pollution. |
priorityDate | 2021-12-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 35.