http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-213538105-U
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_f86d2e2497424466da6ac5807f40cc12 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23F1-46 |
| filingDate | 2020-08-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2021-06-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_73f11a78370f43bf3b8ddf04824855e6 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_dd106566bf371dbf11f66923a2118574 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_37ea455a28cf6332f4aea2b8857228f3 |
| publicationDate | 2021-06-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | CN-213538105-U |
| titleOfInvention | Etching solution recycling and regenerating system |
| abstract | The utility model discloses an etching solution recycling and regenerating system, which comprises an etching solution regenerating kettle, an etching tank and an etching solution filtering kettle; the etching solution regeneration kettle is connected with the etching tank through a first pump, and the etching tank is used as a place for etching a workpiece; the etching solution filtering kettle comprises a metal ion reverse osmosis membrane, the metal ion reverse osmosis membrane divides the etching solution filtering kettle into a first cavity and a second cavity, and the etching tank is connected with the first cavity of the etching solution filtering kettle through a second pump; the second chamber is connected to the etching solution regeneration kettle. According to the technical scheme, the metal ion reverse osmosis membrane blocks metal ions, and the lost hydrofluoric acid, the inhibitor and the chelating agent are added into the acid supplementing kettle to form a new etching liquid. The recovery and regeneration system of the etching solution is carried out in the etching process of the etching workpiece, and the etching process is not influenced. |
| priorityDate | 2020-08-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 29.