http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-213037421-U

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filingDate 2020-08-31-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2021-04-23-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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publicationDate 2021-04-23-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber CN-213037421-U
titleOfInvention Impurity removal system for polycrystalline silicon production
abstract The utility model discloses an impurity desorption system is used in polycrystalline silicon production belongs to polycrystalline silicon production technical field, including the person in charge, the front end of being responsible for links to each other with synthetic rectifying column tower cauldron, be responsible for respectively with sediment thick liquid pipe, first inlet pipe, first discharging pipe, third inlet pipe and third discharging pipe link to each other, be provided with first adsorption tower between first inlet pipe and the first discharging pipe, be provided with first cooler on the person in charge of first adsorption tower front end, be provided with the third adsorption tower between third inlet pipe and the third discharging pipe, be provided with the second cooler on the person in charge of third adsorption tower front end, the rear end of being responsible for links to each other with the rectification head tank.
priorityDate 2020-08-31-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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Total number of triples: 27.