http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-208298786-U
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_e5e0ed06641bdf0bb364e73dffd803f7 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-02 |
| filingDate | 2018-05-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2018-12-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2018-12-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | CN-208298786-U |
| titleOfInvention | Wafer cleaning device in photoresist coating process |
| abstract | The utility model provides the wafer cleaning device in a kind of photoresist coating process, the device includes, pedestal, rotation cup and workbench, it is corresponded in workbench and is provided with first lower limb washer jet at the lower surface for being provided with the first lateral margin washer jet and corresponding wafer at the lateral margin for being provided with top edge washer jet, corresponding wafer at the upper surface of wafer, same level height, the oblique central point in wafer in the hydro-peening direction of the first lateral margin washer jet are kept with wafer when first lateral margin washer jet works.Wafer cleaning device provided by the utility model can preferably remove the pollutant of crystal column surface, avoid influence of the residual of pollutant to Subsequent semiconductor device performance, improve the yield of semiconductor devices. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-110729180-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-110729180-B http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-110600405-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-112024500-A |
| priorityDate | 2018-05-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
| Predicate | Subject |
|---|---|
| isDiscussedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID21226428 http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID450418934 |
Total number of triples: 16.