http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-207833216-U
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_663cad2cddb9415ae5ba8d9c99803cda |
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K2203-1361 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K3-064 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-16 |
| filingDate | 2018-02-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2018-09-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d032e0b179c9066d422c5e99692799b9 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b9fea6307a655e10b5311212eb9dfcc7 |
| publicationDate | 2018-09-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | CN-207833216-U |
| titleOfInvention | The filming device of resist layer |
| abstract | A kind of filming device of resist layer is provided, the filming device of aforementioned resist layer can solve the problems, such as that filming treatment fluid is non-uniform to upstream side adverse current, the filming amount of resist layer of dipping tank in the filming device of the resist layer used for making the resist layer filming for the substrate for being formed with resist layer.In the filming device for the resist layer for having filming processing unit, filming processing unit has the dipping tank equipped with filming treatment fluid, the control feel simulator for applying load by the upper side roller of the entrance roller pair to dipping tank, prevents the adverse current of filming treatment fluid to the upstream side. |
| priorityDate | 2017-02-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 82.