http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-207330423-U

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filingDate 2017-09-06-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2018-05-08-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_12d3e660008ff4b4df6b58ce1fc55964
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publicationDate 2018-05-08-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber CN-207330423-U
titleOfInvention A kind of gas-liquid mixed film low-temperature plasma wastewater treatment device
abstract A kind of gas-liquid mixed film low-temperature plasma wastewater treatment device of the utility model, method are as follows:After waste water is uniformly mixed with working gas, by being entered at the top of plasma wastewater treatment device in low temperature plasma environment, air-water mixture is distributed by the taper water distributor inside plasma wastewater treatment device, and uniform gas-liquid mixed film is formed on taper water distributor surface;Uniform gas-liquid mixed film mixes electric discharge generation active group under low temperature plasma environment and directly contacts and react with the organic pollution in water.The utility model is passed into plasma reactor after using air and liquid mixer, waste water is uniformly mixed with working gas, and forming air-water mixture using taper water distributor, thin and thick is moderate, uniform gas-liquid mixed film, the gas-liquid mixed film electric discharge of formation produces active group and directly contacts and react with water pollutant, improves the removal rate of pollutant.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-107459099-A
priorityDate 2017-09-06-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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Total number of triples: 25.