http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-206742273-U

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classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L33-14
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filingDate 2017-03-21-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2017-12-12-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3407a8e6d8ad436298e00dcea2a03794
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publicationDate 2017-12-12-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber CN-206742273-U
titleOfInvention A kind of epitaxial structure for realizing short wavelength UV LED
abstract The utility model discloses a kind of epitaxial structure for realizing short wavelength UV LED,The epitaxial structure includes the substrate set gradually from bottom to top,GaN cushions,Undoped with GaN layer,Doped N-type GaN layer,MQW AlGaN/GaN layers,P-type AlGaN electronic barrier layers,Gradual change p-type AlGaN layer and p-type GaN layer,The substrate is Sapphire Substrate,The thickness of the GaN cushions is 20~25nm,Growth temperature is 530 550 DEG C,And recrystallize 68 minutes GaN cushions in 1,030 1080 DEG C of constant temperature,It is described undoped with GaN layer thickness be 2.0~2.5 μm,Growth temperature is 1,030 1080 DEG C,The thickness of the doped N-type GaN layer is 2.5 3 μm,Growth temperature is 1,030 1080 DEG C.The utility model uses gradual change p-type AlGaN layer, can reduce polarity effect, weakens electronic barrier layer EBL to the band curvature between P-type layer so that Red Shift Phenomena is improved, and shorter emission wavelength is presented, and luminous intensity also increases therewith.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-106910802-A
priorityDate 2017-03-21-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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Total number of triples: 25.