| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_bce787970b69aeb08d159e7c101c9ed7 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32082
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32422
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32532
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02315
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32357
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3065
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05H1-46
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-3244
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32449
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-32136
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32715
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67069 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J37-32 |
| filingDate |
2016-08-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2017-06-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2a4def593cede2cc68ea12f18194f0f7
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e798ecd983ac561053a2f15728f2190e
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_70726db72127668f932cd65f4a8992e2
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_76b09d00efe2d341d03dd39238df37c6 |
| publicationDate |
2017-06-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
CN-206225317-U |
| titleOfInvention |
For the device and plasma process chamber of corona treatment |
| abstract |
This application discloses device and plasma process chamber for corona treatment.A kind of device for corona treatment includes：First plasma source；First plane electrode；Gas distribution apparatus；Plasma barrier screen cloth；And workpiece chuck.First plasma source produces the first plasma products, first plasma products to be left from first plasma source, the first hole through in first plane electrode.First plasma products continue across the second hole in the gas distribution apparatus.The plasma barrier screen cloth includes the 3rd plate with the 4th hole, and in face of the gas distribution apparatus so that first plasma products pass through the multiple 4th hole.The workpiece chuck is in face of the second side of the plasma barrier screen cloth, so as to limit processing chamber between the plasma barrier screen cloth and the workpiece chuck.4th hole has sufficiently small size, to stop that the plasma produced in the processing chamber reaches the gas distribution apparatus. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-106486335-B
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-106486335-A |
| priorityDate |
2015-08-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |