http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-205571734-U

Outgoing Links

Predicate Object
assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_cf5cff330c06673e339c1d0c990871b3
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B23K26-70
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B23K26-38
filingDate 2016-03-25-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2016-09-14-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5070ec32646825993a5e2a08bdf42407
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9d4a5349a4e50f9ecbb61f6e652d1ff7
publicationDate 2016-09-14-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber CN-205571734-U
titleOfInvention System for become LOGO at sapphire surface preparation CD line and laser cutting
abstract The utility model provides a system for become LOGO at sapphire surface preparation CD line and laser cutting, system of processing includes: a spin -coating even machine of gluing, a step -by -step lithography machine includes: and the column pitch the control unit and the exposing unit that arrange, a developing machine, plasma dry etching machine, a laser cutting machine. The CD line material that system of processing obtained is the sapphire, belongs to to go out the CD line at sapphire surface finishing, and the CD line that forms does not drop, is difficult for the fish tail, and wafer edge ablation region is less than 20um after the cutting of high power laser.
priorityDate 2016-03-25-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

Incoming Links

Predicate Subject
isDiscussedBy http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID23931
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419556032

Total number of triples: 15.