| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_a6e25d4adc71e76de23c4d8f4a486136 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-266
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0332
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0226
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-426 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-426
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-471
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-36
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-475
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate |
2015-06-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2015-09-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0752346dc70c8df04e11e52cab384aed
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_fea2f6a3e137c913b7d47b15ebdaf316 |
| publicationDate |
2015-09-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
CN-204680649-U |
| titleOfInvention |
For the compound mask that energetic ion injects |
| abstract |
This patent discloses a kind of compound mask injected for energetic ion.Mask in this patent is a kind of compound photoresist mask with three-decker, and photoresist mask pattern is produced between implant blocking layer deielectric-coating and top layer sacrificial dielectric film by this mask, injects mask as energetic ion.The compound mask of this patent can avoid the chap denaturing problem of photoresist mask under high-energy ion bombardment, and mask removes noresidue, ensures chip surface cleanliness factor, improves device performance. |
| priorityDate |
2015-01-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |