http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-1782878-B

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filingDate 2005-11-28-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2011-08-10-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8618e175677a613294f637d00a9f7580
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publicationDate 2011-08-10-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber CN-1782878-B
titleOfInvention Positive type photo-sensitive siloxane composition, cured film formed from the composition and device incorporating the cured film
abstract The present invention relates to a positive type photo-sensitive siloxane composition, a cured film formed from the composition and a component having the cured film. The present invention provides a positive photosensitive siloxane composition having high photosensitivity and having such properties as high heat resistance, high transparency and low dielectric constant, used to form a planarization film for a TFT substrate, an interlayer dielectrics or a core or cladding of an optical waveguide. It is a positive photosensitive siloxane composition comprising a siloxane polymer, quinonediazide compound and solvent, characterized in that the light transmittance of the cured film formed of the composition per 3mu of film thickness at a wavelength of 400 nm is 95% or more.
priorityDate 2004-11-26-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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