http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-1782878-B
Outgoing Links
Predicate | Object |
---|---|
assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_129e393582e6bdf4029baf2206522f45 |
classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-022 |
classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0757 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-022 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-075 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08K5-42 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L29-786 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
filingDate | 2005-11-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate | 2011-08-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8618e175677a613294f637d00a9f7580 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9571835891b4a6ff9972191cf0747319 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_51d7c0af49031813cd344a4d16fe6a48 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bee7ce0f322671c98dd397766cc8b108 |
publicationDate | 2011-08-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | CN-1782878-B |
titleOfInvention | Positive type photo-sensitive siloxane composition, cured film formed from the composition and device incorporating the cured film |
abstract | The present invention relates to a positive type photo-sensitive siloxane composition, a cured film formed from the composition and a component having the cured film. The present invention provides a positive photosensitive siloxane composition having high photosensitivity and having such properties as high heat resistance, high transparency and low dielectric constant, used to form a planarization film for a TFT substrate, an interlayer dielectrics or a core or cladding of an optical waveguide. It is a positive photosensitive siloxane composition comprising a siloxane polymer, quinonediazide compound and solvent, characterized in that the light transmittance of the cured film formed of the composition per 3mu of film thickness at a wavelength of 400 nm is 95% or more. |
priorityDate | 2004-11-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 38.