| abstract |
The invention aims to provide a novel monopolymer and a preparation method thereof. The monopolymer has the polymerization characteristic suitable for the copolymerization with other monopolymers; and has excellent light transparency and heat stability, no loss of sensitivity, resolution and dry etching resistance, good solubility in organic solvents and small line edge roughness. The invention also provides a preparation method. The method is applicable for a resist composition used in deep ultraviolet excimer laser lithography and electron beam lithography, and patterns (samples) using the resist composition. |