http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-115220301-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_5139ac25b1cee8d91a47e2057f67ba0d |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K11-025 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K11-02 |
| filingDate | 2021-04-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b8e0fd25668b8b00fd8ad01fe4f0960a http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b97599bea4726239c75dfb7e67710110 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0cb96a65cd03e2ed176ccf83138bc121 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4d67449a6f69255c303fc566de3d44db |
| publicationDate | 2022-10-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | CN-115220301-A |
| titleOfInvention | A kind of quantum dot photoresist and preparation method of quantum dot light conversion layer |
| abstract | The invention relates to a quantum dot photoresist and a preparation method of a quantum dot light conversion layer. The quantum dot photoresist includes a photoresist mother solution, quantum dots uniformly dispersed in the photoresist mother solution, and inorganic additives, and the inorganic additives form coordination with the surface of the quantum dots, and the photoresist The mother liquor, the quantum dots and the inorganic additive can form a homogeneous system, which can be stored stably for a long time; at the same time, using the small steric hindrance of the inorganic additive, it can be used as a ligand to form coordination with the dangling bonds on the surface of the quantum dots , improve the degree of coordination on the surface of quantum dots, reduce electrons trapped by defects on the surface, thereby reducing fluorescence quenching. Moreover, after the quantum dot photoresist is made into the quantum dot light conversion layer, the excess inorganic additives can also be used as scattering particles to increase the optical path of the excitation light source in the light conversion layer, and improve the absorption and conversion of the excitation light source by the quantum dots , in order to increase the light conversion efficiency of quantum dots and improve the brightness. |
| priorityDate | 2021-04-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 80.