| abstract |
The present invention relates to a type of zinc-oxygen cluster compound, its preparation method and application. The zinc oxide cluster compound photoresist molecule shown in formula I is obtained by a direct synthesis method in the next step under normal pressure. The application of the zinc oxide cluster compound includes using the above zinc oxide cluster compound as the only component directly as a photoresist, and as the photoresist, the zinc oxide cluster compound or the photoresist composition is applied on the substrate to form a film. The film prepared from the photoresist of the present invention or its composition has good solubility, film-forming property, adhesion, thermal stability, easy storage and stable structure, and can meet the requirements of different types of photolithography technologies. |