http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-115161613-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_36333273e27f0db23ddddbf80ba79ba7 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-54 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-0036 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-35 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-0641 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-564 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-54 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-35 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-56 |
| filingDate | 2021-04-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4c0f287c6da6b409d04b27f5b095420d http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_70036d0c90dcbe5342c29fed4b74e24d http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bcdc3fa9868479fe7f8675f49fc9fb70 |
| publicationDate | 2022-10-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | CN-115161613-A |
| titleOfInvention | Cleaning methods for deposition chambers |
| abstract | A method of cleaning a deposition chamber, comprising moving a substrate onto a substrate support of a semiconductor processing chamber; performing a deposition process to deposit a material layer on the substrate; moving the substrate out of the semiconductor processing chamber; and performing a first cleaning process, wherein performing a first cleaning process includes providing a first gas into the semiconductor processing chamber through a first conduit in the substrate support, and turning on a radio frequency source to generate a plasma of the first gas to clean the surface of the substrate support; and performing a second cleaning A process wherein performing a second cleaning process includes providing a second gas into the semiconductor processing chamber through a second conduit disposed in a sidewall of the semiconductor processing chamber, and turning on a radio frequency source to generate a plasma of the second gas to clean the substrate support s surface. |
| priorityDate | 2021-04-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 28.