| abstract |
The present invention provides a photosensitive radiation-sensitive or radiation-sensitive resin composition, a photosensitive radiation-sensitive or radiation-sensitive film formed by the above-mentioned photosensitive radiation-sensitive or radiation-sensitive resin composition, a pattern forming method, and production of an electronic device In the method, the photosensitive radiation-sensitive or radiation-sensitive resin composition contains (A) a resin and (B) a compound represented by the specific general formula (1) that generates an acid by irradiation with actinic rays or radiation. |