| abstract |
The present invention relates to a surface treatment composition, a method for producing the surface treatment composition, a method for surface treatment, and a method for producing a semiconductor substrate. [Subject] To provide a solution that can sufficiently remove organic residues existing on the surface of a polished object made of silicon nitride or polysilicon. [Solution] A surface treatment composition for treating the surface of a polished object, comprising: a polymer having a structural unit represented by the following formula (1), At least one of an anionic surfactant and a nonionic surfactant, and water, in the following formula (1), R 1 is a hydrocarbon group having 1 to 5 carbon atoms, and R 2 is a hydrogen atom or a carbon number of 1 to 1. 3 hydrocarbon groups. |