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publicationDate 2022-09-16-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber CN-115066736-A
titleOfInvention Method and apparatus for pulsed inductively coupled plasma for surface treatment processing
abstract The present disclosure provides apparatus and methods for treating workpieces using plasma. In an exemplary embodiment, the apparatus may include a processing chamber. The apparatus may include a plasma chamber defining a dielectric tube with sidewalls. The apparatus may include an inductively coupled plasma source. The inductively coupled plasma source includes an RF generator configured to excite an induction coil disposed around the dielectric tube. The apparatus may include a separation grid separating the processing chamber from the plasma chamber. The apparatus may include a controller configured to operate the inductively coupled plasma source in a pulsed mode. In pulsed mode, the RF generator is configured to apply multiple pulses of RF power to the induction coil. The pulse frequency may range from about 1 kHz to about 100 Hz.
priorityDate 2020-05-01-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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