| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_bce787970b69aeb08d159e7c101c9ed7 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0206
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3003
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02068
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-32105 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-768
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J37-32 |
| filingDate |
2021-03-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_58d39c35bd824bc38c73a7702572f06b
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ce9859ae1c6cc8574a2f4b767f14b8f8
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e32cddfa68432ebb8727d55722e6d4bf
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_569ed710566f95fb4f3561feb1891d7c
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5a24d15e54e7489622db483dd9c991d1
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f58822eeb798b64661ca705e323e6d4a
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_719949763ab26a2b26f05ba1ec7564d2
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d649fe41141c9919e654896745d3a698 |
| publicationDate |
2022-09-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
CN-115053336-A |
| titleOfInvention |
Selective oxidation and simplified pre-cleaning |
| abstract |
Methods for selectively oxidizing a dielectric surface of a substrate surface comprising a dielectric surface and a metallic surface are discussed. Methods of cleaning substrate surfaces including dielectric surfaces and metallic surfaces are also discussed. The disclosed method uses plasma generated from hydrogen and oxygen to oxidize dielectric surfaces and/or clean substrate surfaces. The disclosed method can be performed in a single step without the use of separate competing oxidation and reduction reactions. The disclosed methods can be performed at constant temperature and/or within a single processing chamber. |
| priorityDate |
2020-03-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |