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publicationDate 2022-08-05-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber CN-114864498-A
titleOfInvention semiconductor device
abstract A semiconductor device includes a plurality of first channel nanostructures in a first device region and a plurality of second channel nanostructures in a second device region. The first channel nanostructure is disposed between the first dielectric fin and the second dielectric fin. The second channel nanostructure is disposed between the first dielectric fin and the third dielectric fin. A gate dielectric layer is formed to surround each of the first channel nanostructures and each of the second channel nanostructures. A first work function layer is formed to surround each of the first channel nanostructures. A second work function layer is formed to surround each of the second channel nanostructures. A first gap exists between each adjacent first channel nanostructure, and a second gap exists between each adjacent second channel nanostructure.
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