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filingDate 2022-04-11-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7b6121f360e7d5c51ecb7c7e284cd9d8
publicationDate 2022-08-05-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber CN-114859649-A
titleOfInvention Reticle, lithographic apparatus and method for making a reticle
abstract The present disclosure relates to a reticle, a lithography apparatus, and a method for manufacturing the reticle. The reticle includes: an electrolytic reaction layer, wherein metal elements in the electrolytic reaction layer are configured to be in a deposited metal state or a dissolved ion state; a first control circuit layer, the first control circuit layer is disposed on the first side of the electrolytic reaction layer, and the first control circuit layer includes a plurality of first control electrodes; and the second control circuit layer, the second control circuit layer is disposed on the electrolytic reaction layer on a second side opposite to the first side, and the second control circuit layer includes a plurality of second control electrodes; wherein the light-transmitting state of the pixel area in the reticle is configured to be controlled by the first control electrode included in the pixel area The control voltage between at least a part of the electrode and at least a part of the second control electrode is determined, and the control voltage controls the light transmission state of the pixel region by controlling the deposition amount of metal in the electrolytic reaction layer.
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