| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_eccd894c99fea2d1c0c8735872bb2309 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0274
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-022
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0236
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0233
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0226 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-022 |
| filingDate |
2020-11-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_63f7694c2083e0d7f42e14d27433f545
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c32a24644c04635bd76c703d02095fa2 |
| publicationDate |
2022-07-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
CN-114730130-A |
| titleOfInvention |
chemically amplified photoresist |
| abstract |
The present invention relates to a resist composition comprising (A) a polymer component, (B) a photoacid generator component, (C) a photoactive diazonaphthoquinone component, and (D) a solvent. The polymer component comprises a mixture of novolak derivatives and polymers comprising hydroxystyrene repeating units. The polymer component comprises repeating units having free phenolic hydroxyl moieties and repeating units having phenolic hydroxyl moieties protected by acid cleavable acetal moieties. The positive photoresist composition is suitable for use in the manufacture of electronic devices. |
| priorityDate |
2019-11-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |